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The 2009 Lithography Workshop
Mark Your Calendars!
The 2009 Lithography Workshop Will Be Held At
The Coeur d’Alene Resort (www.cdaresort.com)
June 28-July 2, 2009
Welcome to the Home Page of The Lithography
Workshop!
The 2009 Meeting will be held at the world famous Coeur d’Alene
Resort,
in Coeur d’Alene, Idaho.
The resort is 25 miles from the Spokane, WA airport.
The Technical Program Chairs for this meeting are Frank Schellenberg
(Mentor Graphics) and Bruno LaFontaine (AMD). The Site Chair is Keith
Standiford (KLA-Tencor).
The calendar of events for this conference is:
May 15, 2008 Announcement
of Site
September 1, 2009 Announcement
of Section Chairs
February 1, 2009 Preliminary
Technical Program
February 1, 2009 Conference
Registration Opens
May 1, 2009 Abstract
Submission by Authors
May 1, 2009 Cut-off
date for submission of Abstracts for Poster Session
June 1, 2009 Final
Technical Program with Abstracts On-Line
June 10, 2009 Hotel
Conference Rate Cut-Off Date
The website will be updated periodically as needed.
As in previous meetings, we have arranged for the hotel to extend
the conference rate for 3 days before (arriving the evening of June
24th) and up to 3 days after the conference (leaving July 7th) as
available. This will allow our attendees to spend the July 4th weekend
at the resort, where firework displays over the Coeur d’Alene
Lake are a yearly event. To make your reservations, you should
contact the Resort directly at their Reservation Department, (800)
688-5253. You will need to mention “The Lithography Workshop” to
obtain the conference rates.
If you have questions regarding the Technical Program or Poster Sessions,
please contact either Frank Schellenberg (frank_schellenberg@mentor.com)
or Bruno LaFontaine (bruno.lafontaine@amd.com). If
you have questions regarding the site, please contact Keith Standiford
(keith.standiford@kla-tencor.com). For
conference registration questions, please contact Ken Harrison (ken.harrison1@verizon.net).
We hope that you can join us. We expect the technical program to
be outstanding and the site to be inspiring.
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