Below is a list of our Topical Topics and Chairs
K1> 0.25 Optical Lithography:
Luigi Capodieci (GF) and Andres Torres (Mentor)
K1<.25 Optical Lithography:
Chris Bencher (AMAT) and Vincent Farys (ST)
NGL:
Mark McCord (K-T) and Joy Cheng (IBM- Almaden)
EUV:
Obert Wood (GF) and Mike Lercel (Cymer)
Lithography for non-IC applications:
Liz Dobisz (HGST)
Resists:
Ted Fedynyshyn (MIT-LL) and Cliff Henderson (Georgia Tech)
Metrology:
Rick Silver (NIST) and Nelson Felix (IBM)
Masks:
Emily Gallagher (IBM) and Franklin Kalk (Toppan)
More than Moore:
Jeremy Muldavin (MIT-LL) and Dan Herr (Joint School of Nanoscience and Nanoengineering) NC