Program Chairs
The 2012 Technical Program Chairs are Mardechai Rothschild (MIT LL) and Lars Liebman (IBM).
Mordechai Rothschildis Leader of the Chemical, Biological, and Nanoscale Technologies Group at MIT Lincoln Laboratory. He has played key roles in the development of 193-nm lithography, exploration of 157-nm lithography, early development of liquid immersion lithography, and more recently interference lithography. He has also led a number of programs in microfabrication, nanophotonics, photochemistry, and chemical trace detection. He is a member of the U.S. Lithography Technical Working Group and a member of the organizing committees of several conferences in nanotechnology and microlithography. He holds a B.S. degree in Physics from Bar-Ilan University, Israel, and a Ph.D. in Optics from the Universityof Rochester.
Dr Liebmann holds PhD, MS, and BS degrees from Rensselaer Polytechnic Institute, Troy, NY. He joined IBM in 1991 and has accumulated two decades of experience in continuously pushing the resolution of optical lithography equipment further past its physical limits. Dr Liebmann’s work on layout intensive resolution enhancement techniques forced him to bridge the gap between wafer processing and chip design. His current technical focus in IBM’s Semiconductor Research and Development Center is design-technology co-optimization for sub-resolution patterning of leading-edge technology nodes. Dr. Liebmann holds over 60 patents, has published over 40 technical papers, and has received IBM’s Corporate and Outstanding Technical Achievement awards. For his work on lithography friendly design, Dr. Liebmann was appointed Distinguished Engineer of IBM and Fellow of the SPIE – the International Society for Optical Engineering.
The 2012 Site Chair is Dave Patterson (DARPA-retired).
Dave Patterson retired from DARPA in 2004 where he was Program Manager for the Advanced Lithography Program. Major programs included the definitive work in 193 nm, 157 nm, immersion, x-ray, imprint, and maskless technologies. His program was ranked in the top ten of technology developments during DARPA’s 50 year history. In 1991, he chaired the MicroTech 2000 Lithography Committee and presented the industry’s first roadmap for microlithography.
He was with DoD’s Very High Speed Integrated Circuits Program during the ‘80s, working on manufacturing technology and submicron device development. In 1983, he served on a smallU.S.team which reviewed microelectronics facilities inChina. His early career included work at Naval Research Laboratory, Harris Semiconductor, TI, and Oak Ridge National Laboratory. He graduated fromU.ofTennessee, B.S. ( Engineering Physics) and Ph. D. (Solid State Physics).