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President’s Message 2010 Lithography Workshop Welcome to the 20th Lithography Workshop which is being held November 7-11, 2010 at the Marriott Kauai Resort in Lihue, Kauai (approximately 5 miles from the Lihue airport). With the support of its members, the Lithography Workshop has sponsored a unique program which is carefully designed to cover the latest lithography-related advancements to benefit all participants in their field of expertise. The Workshop held its first meeting in Lake Placid, New York in 1981. The 2010 Workshop is the 20th in a series of meetings that span 29 years promoting the continuing evolution of lithography. The speakers at the Workshop are selected by invitation and represent a broad range of disciplines and covering a wide array of different lithography approaches and requirements. The Workshop is limited to 150 participants. Should you be interested in attending or wish to be added to our mailing list, please contact our Registration Chairman, Ken Harrison (ken.harrison1@verizon.net). The Workshop is modeled to be similar to a “Gordon-Research” meeting but with the intent of addressing more immediate issues facing the lithography community within the next 3-5 years. The attendees of the Workshop share recent advances and knowledge in lithography with others in the community. The Workshop provides an environment where leading researchers from various disciplines can share their thoughts and ideas. A primary intent is to provide an arena for stimulating debate and the meeting schedule is designed to provide the attendees time for side-meetings and discussions. The Workshop has historically focused on leading-edge semiconductor applications, but has also addressed the challenging lithography needs of flat panel displays, disk drives and 3-dimesnional device integration. As in the past, there will be no formal proceedings, picture taking, audio or video recording of the Workshop presentations. Similarly to last year, authors will have the opportunity to voluntarily publish their presentations on the Lithography Workshop Website. The technical sessions have been scheduled for mornings and evenings, with informal meetings between attendees and authors during the afternoon. The Executive Committee is arranging a program that we believe you will find intellectually stimulating and challenging. Putting together a meeting such as this required the contributions of many people. We are especially thankful to the Technical Program Chairpersons and the Session Chairs who have put together the program. This year, the Technical Program Chairs are Dr. Vivek Singh of Intel and Dr. Michael Fritze of DARPA. Each talk is invited and each speaker is recognized for his/her outstanding work in their field. We hope that you will avail yourself to all the sessions and functions that the organizers have planned. This year, the Workshop will be held at the Marriott Kauai Resort in Lihue, Kauai, HI. The resort is approximately 5 miles from the Lihue airport and the Resort has airport pick-up services available (contact the hotel for further information). Recall that the Workshop provides for most of your morning and evening meals and a rental car may not be necessary. As in previous years, we have arranged with the hotel to honor the conference rate for 3 days prior to, and after, the meeting on a space-available basis. Hence, the conference rates will be available from arriving as early as November 3 and leaving as late as on November 15. To make your reservations, please call 1-800-220-2925, and identify your group as The Lithography Workshop. To preserve the Workshop atmosphere, the attendance is limited to 150 attendees. If you intend to attend, we encourage you to register in advance for both the conference (contact Ken Harrison at ken.harrison1@verizon.net) and the hotel (1-800-220-2925). If you would like to attend or would like to be put on our mailing list, please contact registration chairmen Ken Harrison so that you can be added to our mailing list. The Executive Committee welcomes your comments and suggestions to better serve the lithography community.
Andrew M. Hawryluk, Ph.D. |
