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The Technical Program Chairs for the 2009 Lithography Workshop are Frank Schellenberg and Bruno La Fontaine.

Frank Schellenberg has a Ph.D. from Stanford University in nonlinear laser spectroscopy and optical recording (Applied Physics). He began working in 1991 on resolution enhancement technologies (RET) for lithography at the IBM Almaden Research Lab. He has since worked at HP Labs and SEMATECH, managing the development of new RET approaches, and at KLA Tencor, managing projects in the photomask technology and analysis.

In 1998, he joined the startup OPC Technologies, which created software to implement various RETs. This was subsequently acquired by Mentor Graphics and integrated into the Calibre RET product line, where he continues to be employed today.

Bruno La Fontaine is a Fellow at GLOBALFOUNDRIES. He is the EUVL & Litho Tools Program leader, within the Technology Research Group.
Bruno has been active in the field of lithography; first at AT&T Bell Labs, then Lawrence Livermore National Laboratory, and finally at GLOBALFOUNDRIES.
He holds a Ph.D. in Physics from the Institut National de la Recherche Scientifique (Montréal, CANADA)

The Technical Topic Chairs for the 2009 Workshop include:

Computational Lithography                  

 Vivek Singh (Intel)

EUVL                                                 

 Shinji Okazaki (Hitachi) and Patrick Naulleau (LBNL)

Advanced Optical Lithography 

 Tatsuhiko Higashiki (Toshiba)

Metrology                                           

 John Allgair (AMD/Sematech)

Masks                                                 

 Ben Eynon (Molecular Imprint) and
Naoyama Hayashi (DNP)

Nano-Imprint                                      

 Will Tong (HP) and
Doug Resnick (Molecular Imprint)

Novel Patterning and Packaging           

 Yoshio Nishi (Stanford)
Advanced Materials for Patterning   Tom Wallow (AMD) and
Juan de Pablo (University of Wisconsin)

Novel Patterning and Packaging     

 Paul Rissman
e-beam and Maskless Lithography Laurent Pain (CEA-LETI)