PANEL SESSION

Moderator: G. Dan Hutcheson  
Dan is CEO and Chairman of VLSI Research Inc. as well as the director of several web site businesses, including weSRCH.com. His career spans more than thirty years, in which he became a well-known visionary for helping companies make businesses out of technology.
Dan has authored numerous publications and a book on the strategic and tactical aspects of how to succeed in the business of technology. Scientific American invited Dan to author articles on the demise of Moore’s Law and how scientists’ innate abilities to innovate again have outpaced the doomsayers. He has also been the keynote or invited speaker at dozens of conferences.
Dan is arguably best known for his forecasting of strategic infrastructure shifts and his early-eighties development of the first factory cost-of-ownership models, which are now the basis for most large-scale capital decision-making.  His work has included serving as an advisor on innovation to the White House Council of Economic Advisors, teaching invited courses on Manufacturing Economics and The Economics of the Internet at Stanford University, and serving on the Board of Advisors to the Extension School at UC Berkeley.

William H. Arnold
Mr. Arnold received a BA from Hampshire College in 1977 and an MS in Physics from the University of Chicago in 1979.
In 1980, he joined Advanced Micro Devices in Sunnyvale, CA as a lithography process development engineer. In 1984 he was promoted to Manager of VLSI Lithography Development. In 1991, Mr Arnold was named an AMD Fellow, and in 1994 was promoted to AMD Senior Fellow. In 1997, he was promoted to Director of Advanced Patterning Development where he was responsible for the development of lithography, etch, and front end processes in support of microprocessor and flash memory technology development.
In 1998, Mr Arnold joined ASML in Veldhoven, the Netherlands as Chief Scientist. In this role, he is responsible for guiding lithography product developments so that the long-term requirements of semiconductor device manufacturers are met. In 2001, Mr Arnold moved back to the US to lead ASML’s Technology Development Center in Tempe, AZ, in addition to his role as Chief Scientist. TDC works with ASML’s customers to develop next generation lithography processes.

Paul D. Franzon
Paul D. Franzon is currently a Professor of Electrical and Computer Engineering at North Carolina State University.  He earned his Ph.D. from the University of Adelaide, Adelaide, Australia in 1988.  He has also worked at AT&T Bell Laboratories, DSTO Australia, Australia Telecom and two companies he cofounded, Communica and LightSpin Technolo­gies. His current interests center on the technology and design of complex systems incorporating VLSI, MEMS, advanced packaging and nano-electronics. He has lead several major efforts and published over 180 papers in these areas.  In 1993 he received an NSF Young Investigators Award, in 2001 was selected to join the NCSU Academy of Outstanding Teachers, in 2003, selected as a Distinguished Alumni Professor, and in 2005 won the Alcoa award. He is a Fellow of the IEEE.

Iwao Higashikawa-san
Iwao Higashikawa received his BS degree in Polymer Engineering and MS degree in Physics, Electrical and Computer Engineering from Tokyo Institute of Technology. He joined Research and Development Center of Toshiba Corporation in April 1977. From 1977 to now, he involved in the research and development as a lithography specialist.
He has assigned as a research member of SORTEC PXL program for three and half years and he also joined Selete 157nm program for three years.
Currently he is a chief specialist of Lithography Group, Process & Manufacturing Engineering Center, Toshiba Corporation Semiconductor Company.