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President’s Message 2009 Lithography Workshop Welcome to the 19th Lithography Workshop which is being held June 28-July 2 at the world-renowned Coeur d’Alene Resort, in Coeur d’Alene, Idaho (approximately 25 miles from the Spokane, WA airport). With the support of its members, the Lithography Workshop has sponsored a unique program which is carefully designed to cover the latest lithography-related advancements to benefit all participants in their field of expertise. The Workshop held its first meeting in Lake Placid, New York in 1981. The 2009 Workshop is the 19th in a series of meetings that span 28 years promoting the continuing evolution of lithography. The speakers at the Workshop are selected by invitation and represent a broad range of disciplines including sources, masks, resists, metrology and applications and covering a wide array of different lithography approaches. The Workshop is limited to 150 participants. Should you be interested in attending, please contact our Registration Chairman, Ken Harrison (ken.harrison1@verizon.net). The Workshop is modeled to be similar to a “Gordon-Research” meeting
but with the intent of addressing more immediate issues facing the
lithography community within the next 3-5 years. The attendees of
the Workshop share recent advances and knowledge in lithography with
others in the community. The Workshop provides an environment where
leading researchers from various disciplines can share their thoughts
and ideas. A primary intent is to provide an arena for stimulating
debate and the meeting schedule is designed to provide the attendees
time for side-meetings and discussions. The Workshop has historically
focused on leading-edge semiconductor applications, but has also addressed
the challenging lithography needs of flat panel displays, disk drives,
biotechnology and 3-dimesnional device integration. New for this year is an extended emphasis on 3-D architectures. We expect to have many invited papers covering different aspects of 3-D packaging. We will also host a panel discussion, moderated by Dan Hutcheson, debating the attributes of Advanced Lithography vs. Advanced 3-D architecture. As in the past, there will be no formal proceedings, picture taking, audio or video recording of the Workshop presentations. Similarly to last year, authors will have the opportunity to voluntarily publish their presentations on the Lithography Workshop Website. The technical sessions have been scheduled for mornings and evenings, with additional meetings between attendees and authors during the afternoon. The Executive Committee is arranging a program that we believe you will find intellectually stimulating and challenging. Putting together a meeting such as this required the contributions of many people. We are especially thankful to the Technical Program Chairpersons and the Session Chairs who have put together the program. This year, the Technical Program Chairs are Dr. Frank Schellenberg of Mentor Graphics and Dr. Bruno La Fontaine of GLOBALFOUNDRIES. Each talk is invited and each speaker is recognized for his/her outstanding work in their field. We hope that you will avail yourself to all the sessions and functions that the organizers have planned. This year, the Workshop will be held at the Coeur d’Alene Resort (www.cdaresort.com), in Coeur d’Alene, Idaho. The resort is approximately 30 miles from the Spokane, WA airport, and the Resort has airport pick-up services available (contact the hotel for further information). As in previous years, we have arranged with the hotel to honor the conference rate for 3 days prior to, and after, the meeting. Hence, the conference rates ($209/night) will be available from arriving as early as June 25 and leaving as late as on July 7. The Resort usually has a spectacular fireworks display on the July 4th weekend, and we hope that you can participate. To make your reservations, please call 1-800-688-5253, and identify your group as The Lithography Workshop. To preserve the Workshop atmosphere, the attendance is limited to 150 attendees. If you intend to attend, we encourage you to register in advance for both the conference (contact Ken Harrison at ken.harrison1@verizon.net) and the hotel (1-800-688-5253). If you would like to attend but have not received an invitation, please contact registration Chairman Ken Harrison so that you can be added to our mailing list. The Executive Committee welcomes your comments and suggestions to better serve the lithography community. Andrew
M. Hawryluk, Ph.D. |
