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CHAIRMAN’S MESSAGE Welcome to the eighteenth Lithography Workshop, which is being held December 9-13, 2007 at the Wyndham Rio Mar Beach Resort, in Rio Grande, Puerto Rico. The Lithography Workshop, with the support of its members, has sponsored a unique program over the years carefully designed to broadly cover the latest technology advancements to benefit all participants in their field of expertise. The Workshop held its first meeting in lake Placid, New York in 1981 and has spanned 26 years promoting the continuing evolution of lithography. The purpose of this Workshop is to share recent advances in lithography with current and long-term applications of lithography technology. The Workshop provides an open environment where leading researchers can share their thoughts and ideas freely. The intent is to provide an arena for stimulating debate. The Workshop has historically focused on leading-edge semiconductor applications, but has also addressed the challenging lithography needs of other applications, such as flat panel displays, disk drives and biotechnology and BEOL. This is an opportunity for attendees to meet with world-renown investigators in their field. The Workshop format is intended to provide an atmosphere for in-depth discussions of the invited papers presented. This is accomplished by providing time for extensive questions and answers after each paper and during group gatherings. This year, for the first time, we will also have a Poster session to present additional topics of interest. If you are interested in submitting a paper for the Poster Session, please do so by following the instructions listed under “Poster Session” in the Technical Program. In order to promote free interchange, there will be no formal proceedings, picture taking, audio or video recording or reference made to the Workshop presentations. The technical sessions have been scheduled for mornings and evenings, with the opportunity for group gatherings and activities in the afternoon which can provide us with additional informal discussions with authors. The Executive Committee has arranged a program that we believe you will find intellectually stimulating and challenging. Putting together a meeting such as this required the contributions of many people. We are especially thankful to the Technical Program Chairpersons and the Session Chairs who have put together the program. This year, the Technical Program Chairs are Prof. Fabian Pease and Dr. Juan R. Maldonado, both of Stanford University. Each talk is invited and therefore, each person on the technical program is recognized for his/her outstanding work in their field. We hope that you will avail yourself to all the sessions and functions that the organizers have planned. In the past, the Lithography Workshop cooperated with the IEEE Components, Packaging and Manufacturing Technology Society, and gratefully acknowledges their support as well as the continuing supporting given by the following companies:
To preserve the Workshop atmosphere, the attendance is limited to 150. If you intend to attend, we encourage you to register in advance for both the conference and the hotel. There are early-registration discounts for both the hotel and the conference. If you would like to attend but have not received an invitation, please contact registration chairmen Ken Harrison (ken.harrison1@verizon.net) so that you can be added to our mailing list. The Executive Committee welcomes your comments and suggestions to better serve the lithography community. This years’ conference is dedicated to the memory of John P. Reekstin. Andrew M. Hawryluk, Ph.D. |
