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Chairman's Message Welcome to the 25th anniversary of the IEEE Lithography Workshop, which is being held from July 31 to August 4, 2006 at the Delta Prince Edward in Olde Charlottetown, Prince Edward Island, Canada, the birthplace of Canada. The Workshop held its first meeting in 1981 in Lake Placid, New York, site of the 1980 winter Olympics and site of the incredible U.S.A. hockey team victory over Russia. This will be the 17th Workshop held during the span of 25 years to promote the ever continuing evolution of lithography. The Organizing Committee has arranged a technical and social program second to none and we trust you will avail yourself of all the sessions and functions they have planned. The purpose of this Workshop is to share research advances in microlithography theory and practice, with relevance to current and long-term applications of microlithography technology. The Workshop format is intended to provide an atmosphere conducive to in-depth discussion of the invited papers presented in the technical sessions. This will be accomplished by giving each author 25 minutes for the presentation and questions. In order to promote free interchange, there will be no formal proceedings and no picture taking, recording, or references made to the Workshop presentations. The technical sessions have been scheduled for mornings and evenings so afternoons can be free to enjoy the beautiful surrounding areas. Putting together a meeting such as this required the contributions of many people. We are especially thankful to the chairpersons who have put together the technical program. Each talk is invited and, therefore, each person on the technical program is being recognized for outstanding work in their field. The Lithography Workshop cooperates with the IEEE Components, Packaging, and Manufacturing Technology Society and gratefully acknowledges the continuing support given by the following companies: Applied Materials; AMD; ASML; AZ; BRION; Clariant; Corning/Tropel; Cymer; Dai NipponPrinting; Electr. Matls; eMagin; Hoya; Intel; IBM; JEOL; JMAR/SAL; JSR;KLA-Tencor; Leica; Mentor Graphics; Micronic Laser Systems; Microsystems; Nikon Research; Photronics; Rohm and Hass; SEMATECH; Synopsys; TOPPAN Photomasks; TSMC; Ultratech To preserve the Workshop atmosphere, attendance will be limited to 150. The Organizing Committee welcomes your comments and suggestions which can help better serve the lithography community. Those wishing to present significant results or appropriate rebuttal information should contact the program chairman. John P. Reekstin |
